End-Hall ion sources are intended for a creation of ion beams
with low energy and high current.
Ion beam current - from 0.3 A up to 3.0 A, energy of ions in beam - from 50 eV up to
400 eV.
End-Hall ion sources are being applied for some nanotechnologies processes for ion assisting during film deposition, for ion cleaning, etc.
Principle of operation of end-Hall ion sources is in a generating ions and their acceleration in discharge plasma with a subsequent neutralization of beam's space charge with electrons. Ions' acceleration directly in plasma allows to obtain high ion currents from a small area of ion source. Ion sources are classified in accordance with a output shape of ion beam.
Ring ion sources create axis-symmetrical beams
with outlet external diameter from 30 mm to 90 mm. They use both filament and hollow cathodes that gives a possibility of an
obtaining beams of inert and active gases. Such sources are being used, as a rule, for treatment of large amount of targets
(substrates).
Banded ion sources have an outstretched outlet shape of beam with maximum size up to 150 mm. They are intended, in particular, for a treatment of length substrates.
